Researchers from around the world come together each year at the AVS International Conference on Atomic Layer Deposition (ALD) to share advances in this critical process technology, which enables the precise control of deposited films required for leading-edge semiconductor devices.
For the past several years, Lam has been proud to sponsor the Best Student Paper Award. At this year’s conference, which was held on June 15–18 in Kyoto, Japan, Karla Bernal-Ramos received the award for her paper, “The Role of Hydrazine and Its Derivatives in Atomic Layer Deposition of Tungsten Nitride Thin Films.” Karla, a Ph.D. student in the Department of Materials Science & Engineering at The University of Texas at Dallas, received a trophy and a $1,000 cash prize.
The Best Student Paper Award was established to recognize outstanding research performed by a graduate student in the field of ALD. Presentations by full-time students were nominated for the award based on technical merit and presentation quality. The Best Student Paper award is one of the ways that Lam supports and advances the quality of engineering and science education.
Congratulations to Karla Bernal-Ramos, winner of this year’s Best Student Paper Award