Fall ECS Meeting Committed to #FreeTheScience

September 20, 2017
Category:
Technology

Scientists, engineers, researchers, and industry professionals from around the globe will descend upon National Harbor, Maryland, this October to interact at the 232nd Electrochemical Society (ECS) Fall Meeting, which focuses on electrochemical and solid-state science and technology. Through their new initiative to #FreeTheScience, ECS will undertake the groundbreaking endeavor of publishing all their science research as open-access and will host an ECS OpenCon in conjunction with the 2017 Fall Meeting. These activities not only further the advancement of science being used to address global sustainability challenges, but also provide resources for sharing research through training and support from the industry’s best thought leaders and emerging scientists.

In addition to presentations on cutting-edge atomic-scale processing, Lam experts will be sharing advances in dielectric science and materials, electrochemical/electroless deposition, and electronic materials and processing. Lam is also proud to sponsor the 15th International Symposium on Semiconductor Cleaning Science and Technology (G01) and the Atomic Layer Deposition Applications Symposium (G02). Along with our collaborators, we will be participating in the following presentations, including two invited talks.

(Invited) Industry Perspectives on Atomic Layer Etching
K. J. Kanarik (Lam Research)
Symposium G02: Atomic Layer Deposition Applications
Monday, October 2, 8:40 AM

(Invited) Research to Manufacturing: ALD Design for Precision Atomic Layer Fabrication
A. R. LaVoie and P. Kumar (Lam Research)
Symposium G02: Atomic Layer Deposition Applications
Monday, October 2, 11:20 AM

Electroless UPD Monolayer Deposition – A Prelude to Highly Selective Electroless Atomic Layer Deposition Process
D. Solanki (University of Houston), D. Wu (University of Houston), A. Joi (Lam Research), Y.Dordi (Lam Research), and S. Brankovic (University of Houston)
Symposium E01: Fundamentals of Electrochemical Growth from UPD to Microstructures
Monday, October 2, 10:40 AM

Effect of VUV Lamp on Wafer Charging by Single-Wafer Wet Clean
K. I. Sano, R. Dylewicz, X. Man, D. Lou, J. Zhu, G. Harm, and M. N. Kawaguchi (Lam Research)
Symposium G01: 15th International Symposium on Semiconductor Cleaning Science and Technology
Monday, October 2, 2:20 PM

Thermally Activated Gas Phase Chemical Reactions in a Single-Wafer Wet Clean Process
M. N. Kawaguchi, J. Zhu, C. Fischer, X. Man, B. Bandarapu, and S. Kon (Lam Research)
Symposium G01: 15th International Symposium on Semiconductor Cleaning Science and Technology
Tuesday, October 3, 2:00 PM

Superconformal Cobalt Fill Through the Use of Sacrificial Oxidants
M. Rigsby, L. Brogan, N. Doubina, T. Spurlin, J. Zhou, and J. Reid (Lam Research)
Symposium E01: Fundamentals of Electrochemical Growth from UPD to Microstructures
Wednesday, October 4, 9:20 AM

Impact of Alkaline Solutions on Via Resistance Reduction and Critical Dimension (CD) Control for sub-10 nm Technology Nodes
K. Ryan (GLOBALFOUNDRIES), B. Peethala (IBM Research), H. You (GLOBALFOUNDRIES), R. Knarr (Lam Research), F. Mont (GLOBALFOUNDRIES), D. Canaperi (IBM Research), W. Kleemeier (GLOBALFOUNDRIES), P. Mennell (GLOBALFOUNDRIES), R. Quon (IBM Research), and S. Siddiqui (GLOBALFOUNDRIES)
Symposium D01: Semiconductors, Dielectrics, and Metals for Nanoelectronics
Thursday, October 5, 11:20 AM

Complete schedules and registration information can be found on the ECS website. We look forward to seeing you at the conference.

 

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