The fall meeting of the Electrochemical Society will be held October 13-17 in Atlanta, Georgia. A forum for the latest scientific and technical developments in both electrochemistry and solid state science and technology, the biannual meeting features technical symposia, presentations, and poster sessions, as well as networking events.
Lam is pleased to be a sponsor of these symposia: Plasma Nanoscience and Technology (D02), 16th International Symposium on Semiconductor Cleaning Science and Technology (G01), and Atomic Layer Deposition Applications (G02). We will also have three technical presentations, as detailed below.
(Invited) Challenges and Opportunities for Selective Area Processing in High Volume Manufacturing (HVM)
Kashish Sharma, Paul LeMaire, Katie Nardi, Dennis Hausmann
Symposium G02: Area Selective Deposition and Atomic Layer Etching
Tuesday, October 15, 2019, 12:00–12:40 PM
(Invited) Enabling Fan-out Wafer-Level Package (FOWLP) through Innovative Copper Electrodeposition Processes
Bryan Buckalew, Kari Thorkelsson, Justin Oberst, Stephen Banik, Thomas Ponnuswamy
Symposium G06: High Density Interconnection
Tuesday, October 15, 2019, 4:00–4:40 PM
(Invited) Characterization of Isotropic Thermal ALE of Oxide Films in Nanometer-Size Structures
Andreas Fischer, Aaron Routzahn, Thorsten Lill
Symposium D02: Plasma Nanoscience and Technology
Wednesday, October 16, 2019, 9:50–10:25 AM
Complete schedules and registration information can be found on the ECS website. We look forward to seeing you at the conference.