Heading to the 2015 AVS Symposium

October 12, 2015
Category:
Technology

Each autumn, scientists and engineers from around the globe look forward to discussing the latest advances in materials, surfaces, interfaces, and processing at the week-long AVS International Symposium and Exhibition. Over 2,000 people are expected to participate at this year’s event, being held October 18–23 in San Jose, California, and here we’ve highlighted some of the interesting topics and activities for the conference.

 

Focus on Plasma Science
Plasma technology continues to be a key focus area in semiconductor device fabrication. As critical dimensions continue to approach the atomic scale, a broad range of advances are needed, from fundamental studies to manufacturing applications. In support of this effort, Lam Research is pleased to be a silver sponsor of the Plasma Science and Technology Division, a leading forum for discussing recent developments in subjects such as advanced gate etching, interconnect etching, atomic-scale processing, and novel material applications.

 

Panel Addresses the Future
A panel of distinguished industry professionals will talk about the challenges and opportunities they see ahead for the microelectronics industry during the “Moore’s Law and the Future of the Semiconductor Industry” session on Tuesday, October 20, at 4:00 PM. Panelist Dave Hemker, Lam’s Chief Technology Officer, will share his thoughts on the pace of scaling and the future of semiconductor technology.

 

Career Forum
For students and recent graduates interested in exploring technology fields, the Industrial Forum provides an opportunity to learn about career options. Following a session on Nanoparticles for Electronic Materials, Lam technologist Nerissa Draeger will discuss “Careers at Lam Research,” on Tuesday, October 20, at 6:30 PM. She will share an overview of the company and describe innovations and current areas of research. After the presentation, there will be a question-and-answer period and informal discussion.

 

Lam Presentations
You can hear about some of the latest advances from Lam and our collaborators at the following presentations, including three invited talks from our technology experts:

 

(Invited) Atomic Layer Deposition of Silicon Dielectrics: Precursors, Processes, and Plasmas [TF+EM+NS+PS+SM-ThM-1] D. Hausmann
Thursday, October 22, 8:00 AM

(Invited) Around the World of RF-Plasma Generation: A Brief Tour in 80 (Half) Minutes [PS-ThA-3] N. Benjamin
Thursday, October 22, 3:00 PM

(Invited) Atomic Layer Etching of Silicon Dioxide to Enable Self-Aligned Contact Integration [PS+SS+TF-FrM-1] H. Singh
Friday, October 23, 8:20 AM

Advanced Plasma Etch Techniques for Sub-50nm Pitch Contact & Interconnect Etches [PS-TuM-6] A. Labonte (GlobalFoundries); R. Chao, J. Dechene (IBM Albany Nanotech Center); B. Nagabhirava, P. Wang, P. Friddle (Lam Research); N. Rassoul (ST Microelectronics); C. Labelle (GlobalFoundries); J. Arnold (IBM Albany Nanotech Center); M. Goss (Lam Research)
Tuesday, October 20, 9:40 AM

Pattern Loading in Etch through Profile Simulation [PS2-TuA-11] Y. Zhang, S. Sriraman (Lam Research); M. Kushner (University of Michigan); A. Paterson (Lam Research)
Tuesday, October 20, 5:40 PM

In Situ FTIR Diagnostics and Characterization of Etch By-Product Deposition on Chamber Walls and Wafer Surface during Halogen Etching of Silicon [PS+AS+SS-WeA-1] N. Rastgar, S. Sriraman, R. Marsh, A. Paterson
Wednesday, October 21, 2:20 PM

Fluorocarbon-Based Atomic Layer Etching of Si3N4 and Selectivity of SiO2 over Si3N4 [PS+SS+TF-FrM-4] C. Li, D. Metzler, G. Oehrlein (University of Maryland); S. Lai, M. Danek, E. Hudson, A. Dulkin (Lam Research)
Friday, October 23, 9:20 AM

 

Visit Us
If you plan to be at the AVS Symposium, we hope to see you at the panel discussion, technical talks, and/or career forum. To learn more about our products and services or career opportunities at Lam, please visit our website. You can also connect with us on Twitter, Facebook, and LinkedIn.

 

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